Impact of pre-treatments on the properties of HfO2 gate dielectric
碩士 === 國立交通大學 === 電子工程系所 === 93 === In this thesis, we study the impacts of pre-treatments on the properties of HfO2 gate dielectric. We study the physical properties of HfO2 film by material analysis, and study the electrical properties of HfO2 film by measurement of the MOS capacitor (MOSCAP) and...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/24648115249035800796 |