In-situ HF-Vapor Cleaning for Gate Oxide and Stack Gate on Different Silicon Substrates
碩士 === 國立交通大學 === 電子物理系所 === 93 === In this thesis, the effect by using in-situ HF-vapor cleaning before gate oxidation for pMOSFETs on two different silicon substrates – Czochralski grown silicon wafer (Cz-wafer) and hydrogen annealed silicon wafer (Hi-wafer) has investigated. HF-vapor cleaning ste...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85871877980554096754 |