Impact of Ion Implantation Condition on the Characteristics of Double-Diffusion Drain MOSFETs
碩士 === 國立交通大學 === 電機資訊學院碩士在職專班 === 93 === With the progress of integrated circuit technology and the trend of system-on-a-chip (SOC), integrating high power devices with low power circuit is an important in the marketing of electronic application. The Double-Diffusion Drain MOS (DDDMOS) is the first...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/06857323044934340294 |