Effects of Metallization Process on Erase Performance of Split-Gate Flash Memories
碩士 === 國立交通大學 === 電機資訊學院碩士在職專班 === 93 === The characteristics and performance of flash (non-volatile) memory depend on many process stages, especially for flash cell formation related process which belong to front-end process among embedded flash CMOS compatible process flow. It’s evaluation include...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2005
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/01640196605441908769 |