Wafer to wafer control of etching rate in Transformer Coupled Plasma Processing Equipment
碩士 === 國立交通大學 === 機械工程系所 === 93 === Plasma technology is widely used in the semiconductor processing, such as dry etching、thin film deposition、PR stripper etc. By technology evolution of the semiconductor industry, the size of the integrated circuit becomes smaller and smaller. It is important that...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/63319617315210365529 |