Advanced Process Control for PECVD Equipment Using RLS Dynamical Model Tuning Method and Minimum Variance Controller
碩士 === 國立交通大學 === 機械工程系所 === 93 === In this thesis, the relationships among input recipes, Plasma Index (measured from Straatum sensor) and output variables of PECVD equipment are found by utilizing DOE method. The Plasma Index is projected into another space to reduce the dimensions by using Princi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13334504133299640752 |