Fabrication and electrical properties of SiGe nanowires
碩士 === 國立交通大學 === 奈米科技研究所 === 93 === In this thesis, we utilize the result of crystalline mismatch between silicon and germanium to deposit the silicon germanium film with strain. Two deposition schemes, ultra-high vacuum chemical vapor deposition system (UHV-CVD) and low-pressure chemical vapor dep...
Main Authors: | Chub-Yu Liu, 劉俊佑 |
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Other Authors: | Jeng-Tzong Sheu |
Format: | Others |
Language: | zh-TW |
Published: |
2005
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Online Access: | http://ndltd.ncl.edu.tw/handle/32785863741924544696 |
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