The influences of exposed and developed parameters on the shape of periodic structure for interferometric lithography

碩士 === 國立中央大學 === 機械工程研究所 === 93 === In this research, we have developed a laser interference lithography system with high resolution. This system can write pattern directly on the photoresist without using mask, and construct nano-size periodic structures in one or two dimension easily. One dimensi...

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Bibliographic Details
Main Authors: Yi-Ning Wu, 吳宜寧
Other Authors: Jyh-Chen Chen
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/32721487153420815597