Improvement of the optical coating process by cutting layers with sensitive monitor wavelengths
碩士 === 國立中央大學 === 光電科學研究所 === 93 === For a costly optical element production, more precise monitor method is necessary. A finer monitor method is proposed. Based on numerical analysis, the most sensitive monitor wavelength is clearly found out, and the thickness compensation for central wavelength i...
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| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20987835428166394405 |
| Summary: | 碩士 === 國立中央大學 === 光電科學研究所 === 93 === For a costly optical element production, more precise monitor method is necessary. A finer monitor method is proposed. Based on numerical analysis, the most sensitive monitor wavelength is clearly found out, and the thickness compensation for central wavelength is calculated. This method not only can cut layers precisely, but also keep the central wavelength in the right position. It is shown that the performance of optical thin film element monitored by this new method is much better than by the turning point method in coating process.
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