The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications
碩士 === 國立清華大學 === 材料科學工程學系 === 93 ===
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/70217489808515271799 |