The characteristics of Si rich silicon nitride/silicon crystal film in SONOS NVM device application
碩士 === 國立清華大學 === 電子工程研究所 === 93 === In this thesis, we studied the characteristics of Si rich silicon nitride/silicon crystal film in MONOS NVM application. We produced Si rich silicon nitride/silicon crystal film by PECVD and the precursor gas are the mixture of silane diluted to a concentration o...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13670058102580508770 |