The Effects of Self-Assembled & Anti-Sticking Layer on Inserting Mold in Nanoimprint Lithography
碩士 === 國立臺灣海洋大學 === 機械與輪機工程學系 === 93 === Nanoscale structures fabricating by photolithography technique will cost a lot and have a light diffraction limit. It would be a great challenge if we could do it by more effectively, namely by a fast, simple and stable method. Nanoimprint lithography (NIL) p...
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Format: | Others |
Language: | zh-TW |
Published: |
2005
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Online Access: | http://ndltd.ncl.edu.tw/handle/56056899506620428705 |