Summary: | 碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 93 === DC magnetron sputtering is used to deposit 200 Å Fe50Pt50 film on the naturally oxidized Si (100) and glass substrates at various substrate temperatures , then deposited 500 Å Co70.44Tb29.56 film on the FePt film. Finally, a SiNx film with thickness of 300 Å is deposited on the Co70.44Tb29.56 film by RF magnetron sputtering, to protect the Co70.44Tb29.56 film from oxidation. The manufacturing conditions of FePt underlayer are varied to investigate their effects on the magnetic properties of CoTb/FePt films.
From X-ray and TEM analyzing, FePt underlayer has(111)and (001)two different preferred orientations, and the CoTb film has amorphous structure. We find that whatever the preferred orientation of the FePt film is (111)or (001), the saturated magnetization (Ms)and the perpendicular coercivity (Hc⊥)of the Co70.44Tb29.56/FePt films are higher than those of the single layered Co70.44Tb29.56 film. The magnetic anisotropy of the bilayer Co70.44Tb29.56/FePt(001)films is perpendicular to the film plane.
Using FePt(001)film as underlayer, Ms and Hc⊥ of the Co70.44Tb29.56/FePt(001) films are 403 emu/cm3 and 5450 Oe respectively. This bilayer films has high Hc⊥ and Ms values, it has potential to apply in the recording media of heat-assisted magnetic recording.
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