Research of Using Dynamic Mask Photolithography Technology to Fabricate 3D Micro-Device in Single Layer

• Main Authors: Chun-chih Wang, 王群智
• Other Authors: Jeng-Ywan Jeng
• Format: Others
• Language: zh-TW
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/15198053468047665008

碩士 === 國立臺灣科技大學 === 機械工程系 === 93 === The aim of this thesis is studying the hardening mechanism of photo -polymer material and demonstrates new concept and method to fabricate micro 3D components on the single floor of materials. In the fabricating process, this research uses surface forming technology that stands on the characteristic of photopolymer material has different photosensitivity by different wavelength and changes focus position to fabricate 3D components on the single floor of materials. Moreover, this research uses DLP Dynamic Mask Technology to improve the problem that needs lot of masks and alignment, when fabricating 3D component in the semiconductor process. In order to prove the feasibility of the process, it applies to fabricate micro 3D components, such as V-groove, the pattern of Light Guide Plate and micro fan at present. As for fabricating V-groove, it can make the angle more elastic than the etching process. Utilizing the new process on making the pattern of Light Guide Plate, it is more simple and quickly. As for fabricating the micro fan, it directly uses photo-polymer material to build the entity layers and support layers to improve the miscellaneous steps and alignment questions that using the solid state support layer technology fabricates the 3D micro components to produce.