Using Nanoindentation to Measure the Mechanical Properties of Photoresist Thin Films at Various Temperature
碩士 === 聖約翰技術學院 === 自動化及機電整合研究所 === 93 === This study uses nanoindentation to measure the mechanical properties of photoresist thin films associated with a indentation simulation by way of the finite element method. The SU8 photoresist is coated on the silicon wafer with various spin coating speed. T...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/11947560496826506278 |