Analysis and System Intergration of the Optical Proximity Correction on the basis of SPLAT
碩士 === 南台科技大學 === 電子工程系 === 93 === With the rapid development of semiconductor industry, lithography technology of higher density and narrower line-width has become the most important step of IC manufacture. When the line width of mask pattern is smaller than the light wavelength, it may result in l...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/42552131794828252564 |