Study of MgO Thin Film Grown by RF-sputter in Application of Secondary Electron Emission
碩士 === 大同大學 === 光電工程研究所 === 93 === Our purpose is to deposit MgO films by reactive R.F. sputtering deposition, we completed the dynode devices on INVAR substrates. Then the secondary electron emission yield of MgO film were measurement on the dynode structures. We successfully demonstrated that prim...
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| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/59216043773875236138 |
| Summary: | 碩士 === 大同大學 === 光電工程研究所 === 93 === Our purpose is to deposit MgO films by reactive R.F. sputtering deposition, we completed the dynode devices on INVAR substrates. Then the secondary electron emission yield of MgO film were measurement on the dynode structures. We successfully demonstrated that primary electron energy effect the curve of SEE yield according to previous study.
We found that the magnitude of the secondary electron emission (SEE) yield of the MgO films strongly depends on the film thickness, we ascribed it to the electric field through the insulating MgO layer. When the thickness of MgO films increased, the SEE yield δ also increase. And the maximum value of the SEE yield δ can be up to 7 at 180 nm MgO layer.
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