Applications of electron beam lithography to the fabrication of near-field mask
碩士 === 大同大學 === 材料工程學系(所) === 93 === Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor devices. Because of its diffraction limit, conventional optical or ultraviolet photolithography is becoming increasingly inadequate. In o...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2005
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/42550591817798252392 |