The Effect of Substrate Types on the Carbon Films Synthesized by RF Plasma Enhanced Chemical Vapor Deposition
碩士 === 大同大學 === 材料工程學系(所) === 93 === This research investigated the effect of substrate types on the carbon films synthesized by RF plasma enhanced chemical vapor deposition. Four different substrates, silicon wafer（100）, glass, flat polished and mirror polished alumina, were used. The carbon films...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/82111754179202105311 |