the optical properties of the nitride layer of the flash devices.

碩士 === 國防大學中正理工學院 === 應用物理研究所 === 94 === In this paper, we used several methods, including photoluminescence (PL), Raman spectroscopy and Fourier transform infrared spectroscopy to study the optical properties of the nitride layer of Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) devices. The SONOS dev...

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Bibliographic Details
Main Authors: Chang Chi_Kuang, 張季光
Other Authors: 王哲釧
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/35052109494168280399