Plasma-assisted supercritical carbon dioxide cleaning process for photoresist stripping applications
碩士 === 國立中正大學 === 化學工程所 === 94 === Because of increasing studies and developments of environmental benign fabrication process, it remains a challenge to use non-aqueous cleaning techniques to remove residues of metal, photoresists, organic moieties and particles from the surface. As the length scal...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20598457956689841084 |