Fault Detection and Classification of PECVD equipment Using Wavelet Transform

碩士 === 中原大學 === 機械工程研究所 === 94 === The plasma-enhanced chemical vapor deposition (PECVD) process has been developed for thin film deposition in the semiconductor and TFT-LCD industries for decades. During the process, plasma plays an important role to the success of deposition. It is generated by RF...

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Bibliographic Details
Main Authors: CHUN-YING HUANG, 黃俊穎
Other Authors: Yaw-Jen Chang
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/66305584643975763701