Improving the Electrical Characteristics of NixTi1-xO High K Dielectric by Plasma Treatment and Pre-oxidation Treatment for MIM Capacitors
碩士 === 逢甲大學 === 產業研發碩士班 === 94 === RTA( Rapid Thermal Annealing) Technology has been applied to the process in VLSI, extensive with thermal budget, because RTA technology can insert the advantage of bringing the environment that the chip is in up to more than 1000 degrees Centigrade within short tim...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/86582060788486740155 |