An Investigation on The Effect of Surface Tension and Gravity on The Profile of Photoresist in Reflow Process
碩士 === 國立中興大學 === 機械工程學系所 === 94 === Photoresist has been widely used for forming patterns in different scales. When it solidifies from melting condition, for example by the reflow process, its profile deforms due to surface tension and gravity. This research is aimed to investigate the influence of...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/12868057608335271028 |