Fabrication of electrostatical microactuator by electrochemical etching technique
碩士 === 國立成功大學 === 工程科學系碩博士班 === 94 === Traditionally, we usually use the inductively coupled plasma reactive ion etching (ICP-RIE) technology of dry etching when fabricating high aspect of silicon structures in Micro Electro Mechanical System (MEMS). However,the fabricating equipment is very expensi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/69037819421475038586 |