Simulation of Topography and Microstructure for Sputtered Films

碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 94 ===   With the increasing integration and the shrinking size of devices on chips, the uniformity and microstructure of sputtered films become critical for the reliability and physical properties of devices. With the simulation of sputter deposition, we can stud...

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Bibliographic Details
Main Authors: Chung-Dan Chang, 張瓊丹
Other Authors: Weng-Sing Hwang
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/81144619375528038773