Investigation on the Interfacial Stability of Copper/Tantalum Nitride/Dielectrics Multilayered Systems
博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 94 === In this study, the characteristics of various Cu/Ta-N/dielectric /<Si> structures before and after heat treatment were explored. Dielectric materials with low dielectric constants used in this study were fluorinated silicate glass (FSG) and organosili...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/53194692128455136559 |