Study of Processing Parameters in the Nanoimprint Lithography
碩士 === 國立成功大學 === 航空太空工程學系碩博士班 === 94 === Abstract Subject: Study of Processing Parameters in the Nanoimprint Lithography Student: I-Chin Hsin Advisor: Wen-Bin Young In recent years, many new lithography techniques have been developed for nano-scale fabrication. Among those techniques, nanoimprint...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/45824147072840886516 |