Modeling of Thin Film Induced Substrate Stress and Its Application in Semiconductor Device Isolation Process
碩士 === 國立成功大學 === 機械工程學系碩博士班 === 94 === Isolation techniques are essential for semiconductor device for reducing interferences between devices for sub-micro and sub 100-nm fabrication process. By separating active regions with oxide isolation structures, it is possible to reduce cross-talk between e...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/02918180569470553378 |