Degradation of ultra thin oxide under nano-scale constant voltage stress(CVS)
碩士 === 國立暨南國際大學 === 電機工程學系 === 94 === The main purpose of the thesis is to study the degradation and breakdown behavior of ultra-thin oxide under nano-scaled stress by using conductive atomic force microscopy (C-AFM) in conjunction with the semiconductor parameter analyzer HP4156C. The conductive t...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/21864798641585147867 |