Ni-Metal Induced Lateral Crystallization of Amorphous Silicon-Growth Mechanism and LTPS TFTs Device Performance
博士 === 國立交通大學 === 材料科學與工程系所 === 94 === In this thesis, Ni-metal induced lateral crystallization (NILC) of amorphous silicon (α-Si) has been studied. The influence of tensile stress on the growth mechanism of NILC is investigated. Furthermore, we fabricate the LTPS TFTs by Ni-metal imprint-induced cr...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20854110303949352237 |