Studies on Dry Etch of Low Dielectric Constant Nanoporous Silica Thin Films
碩士 === 國立交通大學 === 材料科學與工程系所 === 94 === Due to the rapid increase in transistor density and the operation speed of an IC chip, the ultralarge-scale integrated circuit (ULSI) has an urgent demand for scaling down the device size, and thus the dimension of the interconnect accordingly. Consequently, t...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/37393144934146257011 |