Research of membranes technique for the CMP waste water that used NH4F cleaning method
碩士 === 國立交通大學 === 工學院碩士在職專班產業安全與防災學程 === 94 === Semiconductor industry is thriving in the world. Various processes are developed continuously. Various kind of waste produced in the process also appears continuously. Chemical Machine Polish is an indispensable process for water flatness. The produced...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/82221788380716840285 |