Property Research of the SiO2 Thin Films Deposited by Different Processes from Si and SiO2 as Starting Materials
博士 === 國立中央大學 === 光電科學研究所 === 94 === The properties of SiO2 thin films deposited by different process and from different starting material were discussed and compared. Three processes -E-beam gun evaporation, Ion beam sputtering, and magnetron sputtering- were used to deposit SiO2 thin films, and Si...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/12526944873715104593 |