Aluminum Nitride Films for Surface Acoustic WaveDevice Applications
碩士 === 國立高雄第一科技大學 === 光電工程研究所 === 94 === Abstract This thesis focus on the growth the c-axis preferred orientation (002) oriented of aluminum nitride (AlN) thin film on Si(100) wafer using DC-reactive magnetron sputtering. We use the Al metal target (99.999% purity) at the in-line sputtering system...
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Format: | Others |
Language: | zh-TW |
Published: |
2006
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Online Access: | http://ndltd.ncl.edu.tw/handle/93980713541239707087 |