Intelligent Method Application to Optimum Process Parameter on TiO2 Thin Film

碩士 === 國立高雄第一科技大學 === 機械與自動化工程所 === 94 === ABSTRACT In the paper, we purposed the Intelligent Algorithm which is combined Taguchi Method, Neural Network and Genetic Algorithms, is applied to optimum process parameter to manufacture Titanium Dioxide (TiO2) thin film on PVD system. In proof the method...

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Bibliographic Details
Main Authors: Gong-Ming Hsu, 許恭銘
Other Authors: Jinn-Tsong Tsai
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/12344231546969634915