Investigation of optimum parameters of sensitize/activation by Taguchi methods and its application to electroless Ni-Cu-P
碩士 === 國立屏東科技大學 === 材料工程研究所 === 94 === This work studied the optimum parameters of sensitize/activation to apply on electroless Ni-Cu-P plating. The deposits were characterized by scanning electron microscope（SEM）, field emission scanning electron microscopes（FE-SEM）, transmission electron microscop...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/83302595118307807494 |