The Study of BZT Thin Film Deposited on ITO Substrate by RF Magnetron Sputtering
碩士 === 國立中山大學 === 電機工程學系研究所 === 94 === In this study, the reactive rf magnetron sputtering was used to deposit Ba(Zr0.1,Ti0.9)O3 (BZT) ferroelectric thin films on ITO/Glass substrate, and MFM structure was fabricated. The effects of various sputtering parameters on the characteristics of thin films,...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/63398095514544935756 |