Increasing uniformity in nano-imprint lithography by designing mold structure
碩士 === 國立清華大學 === 動力機械工程學系 === 94 === Nano-imprint technique has the advantage of high throughput, sub-10nm resolution and low cost. In the printing process, however, the mold deformation often occurs and causes a great concern of the quality of pattern transfer, such as the uniformity. This paper p...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/35879106146857204940 |