The study of nanoimprint lithography with the novel UV-based mould
碩士 === 國立清華大學 === 電子工程研究所 === 94 === As progress of IC fabrication technology, the device size was scaling down gradually. According to the prediction of ITRS (International Technology Roadmap For Semiconductors Conference) of 2005, 1/2 Pitch of the component has reached 57nm in 2008, and will reach...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/38183694510677551365 |