Scanning probe lithography and electrostatic force microscopy study on chromium film and chromium oxide
碩士 === 國立臺灣大學 === 物理研究所 === 94 === Scanning probe microscope has been extensively used to perform nanometer and atomic-scale modifications on a great variety of surface. The advantages of scanning probe lithography technique are its high resolution, excellent alignment accuracy, high reliability, an...
Main Authors: | Ju-Min Huang, 黃如敏 |
---|---|
Other Authors: | 林敏聰 |
Format: | Others |
Language: | zh-TW |
Published: |
2005
|
Online Access: | http://ndltd.ncl.edu.tw/handle/18213548185738453014 |
Similar Items
-
Skew measurement by scanning electrostatic force microscopy
by: Shimizu, David Tadashi
Published: (2007) -
Skew measurement by scanning electrostatic force microscopy
by: Shimizu, David Tadashi
Published: (2007) -
Skew measurement by scanning electrostatic force microscopy
by: Shimizu, David Tadashi
Published: (2007) -
Microstructure and optoelectronic properties of copper chromium oxide thin films
by: Shih-Min Huang, et al. -
Application of Electrochemical Lithography to Self-Assemble-Monolayer Film Using Scanning Probe Microscope
by: chain-min huang, et al.
Published: (2004)