Measurements of Uniformity of Plasma Etching System Using Planar Type Multiple Probes
碩士 === 國立臺灣大學 === 應用力學研究所 === 94 === Etching process has played a crucial role in modern semiconductor industry. Most suppliers tried hard to investing research and development as their own nucleus technology. Applied Materials had developed a device, diagnostic pedestal assembly, for measuring the...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/34806645482063948629 |