Evaluation of Ternary Alloy TaCoN Thin Films Deposited by Reactive Sputtering for Copper Metallization
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 94 === Thin-film properties and diffusion barrier characteristics of TaCoN films on silicon substrate prepared by a dc reactive magnetron sputtering at different nitrogen partial pressures are investigated. This work examines the sputtering nitrogen partial pressur...
| Main Authors: | , |
|---|---|
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/af545b |