The Study of Optimal Parameters for Contact Hole Etching Process by Design of Experiments
碩士 === 國立臺北科技大學 === 化學工程所 === 94 === In the integrated circuit process, small dimension pattern often needs to be formed on the wafer. The formative method of the pattern is to use the etchant to remove the exposure photo resist so that pattern can be directly transfer to red wafer. Etching method i...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/6vbsck |