Photoluminescence Characteristics of Zn2SiO4:Mn Thin Films By Combinatorial Chemistry Method
碩士 === 國立臺北科技大學 === 有機高分子研究所 === 94 === A thin film of Zn2SiO4:Mn was prepared on silicon wafer using combinatorial co-sputtering technique. The optimized compositions for highest photoluminescence (PL) quantum yield in Zn2-xSiO4:Mnx is 50% of oxygen concentrations, 150 W of ZnO sputtering power, 20...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/k357q3 |