The Investigations of Humidification and Removal Efficiency for Gas Contamination by Air-washer in Make-up Air Unit

碩士 === 國立臺北科技大學 === 冷凍空調工程系所 === 94 === The micro-contamination has been shifted to Airborne Molecular Contaminants (AMCs) caused by smaller pitch of wafer manufacturing process requested by semi-conductor industries. The AMCs generated in the clean room can be removed by chemical filter installed o...

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Bibliographic Details
Main Authors: Yi -Long Chang, 張義龍
Other Authors: Shih-Cheng Hu
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/6ebf7f