The Effectof Biased N2 Plasma on Silicon Nitride Films
碩士 === 大同大學 === 光電工程研究所 === 94 === In this study, Self-biased nitrogen plasma treatment was used to improve the electrical characteristics of silicon nitride films, such as leakage current density and breakdown electrical field. The silicon nitride films were prepared by plasma enhanced chemical vap...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/75449574824291577955 |