Fabrication of three-dimensional photonic crystal templates by assembling holographically multilayers
碩士 === 國立中正大學 === 物理所 === 95 === For using assembling holographically multilayer technique to fabricate multilayer, we need material with high absorption at 325nm the exposure wavelength (He-Cd) which is used to expose. Instead of SU82002, mixed photoresist (SU82002/S1818) is more suitable to fabric...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/41194286953400007273 |