Analysis of Patent Map for Surfactant Applied in Photoresist
碩士 === 長庚大學 === 企業管理研究所 === 95 === Photoresist is consisted of resin, hardened additive, hardened initiator, monomer, polymer and surfactant etc. It’s purpose is to define pattern. First, search patent map analysis of surfactant applied in photoresist by using patent analysis software on European Pa...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/75539388310209431498 |