The Structure of Hydrogenated Microcrystalline Silicon (μc-Si:H) TFTs Deposited by PECVD
碩士 === 中原大學 === 電子工程研究所 === 95 === The hydrogenated microcrystalline silicon (μc-Si:H) TFTs are prepared by plasma-enhanced chemical vapor deposition(PECVD) with the controlling factors of these experiments including 0.5% SiH4/H2 gas flow rate, 1,500W RF power, 650Pa pressure, and 3000sccm Ar carrie...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/23032740130974652463 |